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Advanced Energy Unveils Its Newest RF Power-Delivery System

Breakthrough RF technology keeps pace - in real time - with the most abrupt plasma-impedance changes, enabling faster transitions, shorter process steps and reduced process times
by Staff Writers
Fort Collins CO (SPX) Jul 10, 2007
Advanced Energy Industries has announced its newest power platform: the Paramount RF-power delivery system. Featuring unprecedented power- delivery accuracy and control for increasingly complex film stacks and fine feature sizes, the 3 kW Paramount system is well suited for both etch and deposition processes in semiconductor, FPD, MEMS and solar photovoltaic manufacturing. AE will highlight the new Paramount platform during SEMICON West 2007, to be held July 17-19 at San Francisco's Moscone Convention Center.

Next-generation device fabrication processes feature anti-reflective coatings, hard masks, cap layers and stop layers in their recipes. Process designers must account for these layers while at the same time accurately etch or deposit the primary layer that may comprise multiple compositions and doping profiles.

The Paramount platform easily accommodates these complexities with ultra-accurate power control and delivery across the full output range-both on and off 50 ohm-for seamless process transitions in etch, strip, PECVD, HDP-CVD, PVD and PEALD. Where pulsing is required to enable next-generation process steps, the Paramount system's optional pulse and pulse synchronization features offer the widest pulse-frequency range available.

Hans Betz, president and CEO of AE noted, "The Paramount system continues AE's tradition of enabling process-power innovation. This new platform has also facilitated AE's continued, technical collaboration with our valued OEM customers. Paramount systems are already installed on next-generation etch platforms at major OEMs worldwide."

The Paramount RF power-delivery system raises the bar for RF power products -- offering the finest control in the industry, with breakthrough performance and technology. This half-rack, 3 kW RF power supply's impedance measurement rivals the accuracy of a network analyzer, enabling unprecedented power delivery accuracy and control at 13.56 MHz fixed or variable frequencies.

Able to keep pace -- in real time -- with the most abrupt plasma-impedance changes, the Paramount system enables faster transitions, shorter process steps and reduced process times, while optional frequency tuning performs virtually instantaneously (within msec) -- faster than any other product on the market. The result is truly unprecedented accuracy, repeatability and process control -- for 50 ohm and non-50 ohm loads.

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